To provide a low friction sliding member having more excellent and lower shearing force than MoS2 and to provide a low friction sliding mechanism using the same.
This low friction sliding member has a hard carbon thin film on at least a part of a sliding face, and a tribo-film containing ether, oxide, and alcohol is formed when sliding while an organic oxygen compound exists on the hard carbon thin film (except the case where both of the sliding faces have a hard carbon thin film composed of a-C diamond-like carbon, and lubricating oil containing poly-α-olefin and glycerol monooleate exists between the sliding faces). The tribo-film is formed in a scope of depth of 10 nm or less from a sliding surface of the hard carbon thin film. The low friction sliding mechanism uses the low friction sliding member and includes the organic oxygen compound on the sliding face formed by the low friction sliding members and the sliding face formed by the low friction sliding member and a metallic member.
KANO SAIHEI
KANO MAKOTO
YASUDA YOSHITERU
OKAMOTO YUSUKE
MABUCHI YUTAKA
UENO TAKAFUMI
JEAN MICHEL MARTIN
NISSAN ARC LTD
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| WO2005014763A1 | 2005-02-17 | |||
| WO2005014760A1 | 2005-02-17 |