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Patent Searching and Data


Title:
LOW-LUSTER POLYCARBONATE RESIN COMPOSITION
Document Type and Number:
Japanese Patent JPH0885749
Kind Code:
A
Abstract:

PURPOSE: To obtain a polycarbonate resin compsn. which is excellent not only ultraviolet resistance and mechanical characteristics but also gives a molding having the surface with a low luster.

CONSTITUTION: This low-luster polycarbonate resin compsn. contains 5-50 pts.wt. polymethyl methacrylate, 70-30 pts.wt. polycarbonate resin, 3-30 pts.wt. impact modifier, and 1-20 pts.wt. talc of which at least 98% of the total particles have particle sizes lower than 44μm and which has an aspect ratio of 4-24.


Inventors:
RIYUU CHIYOUHOU
ITOI HIDEYUKI
Application Number:
JP24855494A
Publication Date:
April 02, 1996
Filing Date:
September 17, 1994
Export Citation:
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Assignee:
GE PLASTICS JAPAN LTD
International Classes:
C08K3/34; C08G64/00; C08G64/06; C08K3/00; C08L33/04; C08L33/06; C08L33/12; C08L55/00; C08L55/02; C08L69/00; (IPC1-7): C08L33/12; C08G64/06; C08K3/34; C08L33/06; C08L33/12; C08L55/02; C08L69/00