PURPOSE: To enable obtaining of high durability with excellent productivity by forming a film containing electrically conductive titanium oxide on a substrate surface and then forming a film of a lower refractive index than that of the film thereon.
CONSTITUTION: A low-reflecting antistatic film is produced by applying a solution containing one or more of compounds expressed by the formula Ti(C5H7O2)n(ORm [(n+m) is 4; m is 0-3; n is 1-4; R is 1-4C alkyl] and electrically conductive titanium oxide for the antistatic film onto a substrate, then heating the resultant film, forming an antistatic film (A) having a high refractive index, subsequently applying a solution containing one or more of monomers expressed by the formula Si(OR)1Rn or their polymers onto the formed film (A), then heating the resultant film and forming a film (B) having a lower refractive index than that of the film (A).
KUBOTA KEIKO
HIRATSUKA KAZUYA
MORIMOTO TAKESHI
TAKEMIYA SATOSHI
KAWASATO TAKESHI
