Title:
LOW-SURFACE-TENSION SULFURIC ACID COMPOSITION
Document Type and Number:
Japanese Patent JP3261819
Kind Code:
B2
Abstract:
PURPOSE: To obtain a sulfuric acid compsn. which has a low surface tension, has detergency enough for cleaning a silicone wafer, and hardly adversely affects the surface of the wafer after the cleaning.
CONSTITUTION: This compsn. contains a fluorine surfactant, a tert-ammonium fluoroalkylsulfonate of the general formula I: R1-(CX2)n-SO3-A [wherein R1 is an alicyclic fluoroalkyl group; X is H or F; n is an integer of 0-3; and A is NHR23 or NHR33N (wherein R2 is lower alkyl and R3 is lower alkylene)].
More Like This:
Inventors:
Hiroyuki Tanaka
Naoki Sako
Yasuhiro Ohmura
Naoki Sako
Yasuhiro Ohmura
Application Number:
JP21276193A
Publication Date:
March 04, 2002
Filing Date:
August 27, 1993
Export Citation:
Assignee:
Mitsubishi Chemical Corporation
International Classes:
C09D9/00; C09K13/08; C11D1/14; C11D7/08; C11D7/34; C11D10/02; C23G1/00; H01L21/304; (IPC1-7): C11D10/02; C09D9/00; C09K13/08; C11D1/14; C11D7/08; C11D7/34; C23G1/00; H01L21/304
Domestic Patent References:
| JP4325599A | ||||
| JP4323300A | ||||
| JP2240285A | ||||
| JP570798A |
Attorney, Agent or Firm:
Koji Hasegawa
Previous Patent: DISPLAY APPARATUS FOR PRESENT POSITION OF MOVING BODY
Next Patent: COOLING STRUCTURE FOR HEATING ELEMENT MOUNTING BOARD
Next Patent: COOLING STRUCTURE FOR HEATING ELEMENT MOUNTING BOARD