Title:
低温アーク放電イオンめっきコーティング
Document Type and Number:
Japanese Patent JP6896691
Kind Code:
B2
Abstract:
Coating method for arc coating or arc ion plating coating of substrates in a vacuum chamber in which using an arc evaporator solid material that functions as cathode is evaporated, during arc evaporation the motion of the cathode spot on the solid material surface is accelerated using a magnetic field for avoiding ejection of a large amount of macro-particles or droplets from the solid material surface, negative charged particles resulted from the arc evaporation flow from the cathode to an anode, characterized by the motion of the negative charged particles from the cathode to the anode fundamentally doesn't cause an additional increase of the absolute value of the potential difference between cathode and anode allowing a lower increment of the substrate temperature during coating.
Inventors:
Krasnitzer, Siegfried
Krapov, Dennis
Lecht Harler, Marx
Krapov, Dennis
Lecht Harler, Marx
Application Number:
JP2018192470A
Publication Date:
June 30, 2021
Filing Date:
October 11, 2018
Export Citation:
Assignee:
OERLIKON SURFACE SOLUTIONS AG, PFAEFFIKON
International Classes:
C23C14/32; C23C14/06; H05H1/48
Domestic Patent References:
| JP9148112A | ||||
| JP2001040467A | ||||
| JP2009144236A |
Attorney, Agent or Firm:
Fukami patent office