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Title:
LOW-TEMPERATURE LIQUEFIED GAS FLOW RATE MEASURING SYSTEM
Document Type and Number:
Japanese Patent JP2008291872
Kind Code:
A
Abstract:

To provide a flow rate measuring system easy in maintenance or correction of its instruments while keeping a heat insulation performance necessary for flow measuring equipment.

The flow rate measuring system is interposed in a low-temperature liquified gas transfer path (2) for transferring low-temperature liquified gas in a liquid status from a supply storage tank (1) of the low-temperature liquified gas into a liquid-receiving reservoir. The system is stored in a cold chamber (7) of a vacuum heat insulation structure composed of a supercooling processing device (4) for performing supercooling processing the low-temperature liquified gas during transfer, a flow meter (5), and a flow control unit (6) together with pipes to be able to open/close. The supercooling processing device (4) is composed of an immersion vessel (8) and a heat-exchanging part (9) housed inside the immersion vessel (8). A branching path (10) branching from the low-temperature liquified gas transfer path (2) in the cold chamber (7) is communicated inside the immersion vessel (8) of the supercooling processing device (4).


Inventors:
NAKAMURA TETSUJI
KAMEMOTO SHUJI
SAKURAI SHIGERU
TANABE MINORU
Application Number:
JP2007136073A
Publication Date:
December 04, 2008
Filing Date:
May 23, 2007
Export Citation:
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Assignee:
IWATANI INT CORP
TOKIKO TECHNO KK
International Classes:
F17C13/02; F17C9/00; G01F1/00
Domestic Patent References:
JPS58140615A1983-08-20
JP2006200553A2006-08-03
JP2002130598A2002-05-09
JP2003065939A2003-03-05
JP2002131110A2002-05-09
Attorney, Agent or Firm:
Shoji Suzue