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Title:
LUBRICATION METHOD USING HYDROCARBON TYPE MONOMOLECULAR FILM
Document Type and Number:
Japanese Patent JP2009191168
Kind Code:
A
Abstract:

To provide a lubrication method of reducing friction and wear of a hydrogen-terminated silicon substrate by using a self-organized film directly coupled to the hydrogen-terminated silicon substrate.

In the lubrication method of reducing friction and wear, a monomolecular film made of a straight chain 1-alkene represented by general formula: CH3-(CH2)n=CH2 (in the formula, n=12 to 18) is disposed on the hydrogen-terminated silicon surface, and is used as a lubrication film.


Inventors:
NAKANO YOSHINORI
ISHIDA TAKAO
SUGIMURA HIROYUKI
Application Number:
JP2008033364A
Publication Date:
August 27, 2009
Filing Date:
February 14, 2008
Export Citation:
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Assignee:
NAT INST OF ADV IND & TECHNOL
International Classes:
C10M177/00; C10M105/04; C10N30/06; C10N40/00; C10N50/00; C10N70/00
Other References:
JPN7012004519; Corinne Miramond et al.: '1-Octadecene monolayers on Si(111) hydrogen-terminated surfaces: Effect of substrate doping' Journal of Applied Physics Vol.96, No.3, 2004, p.1529-1536
JPN6012057904; Jinfang ZHOU et al.: 'Characterization and Tribological Behavior of Octadecene, Dodecene and Undecenoic Acid Films on Subs' Journal of Materials Science & Technology Vol.21, No.5, 2005, p.671-674
JPN6012057907; Luzheng Zhang et al.: 'Measurements of Friction and Adhesion for Alkyl Monolayers on Si(111) by Scanning Force Microscopy' Langmuir Vol.18, 2002, p.5448-5456
JPN6012057910; Alexander B. Sieval et al.: 'An Imporoved Method for the Preparation of Organic Monolayer of 1-Alkenes on Hydrogen-Terminated Sil' Langmuir Vol.15, 1999, p.8288-8291