Title:
MEMSデバイスの製造方法およびMEMSデバイス
Document Type and Number:
Japanese Patent JP5463961
Kind Code:
B2
Abstract:
There is provided a method for fabricating a device, preferably for a micro electro electro mechanical system. The method includes forming a first electrode on a substrate, where the first electrode has a first sloped end at least at one end thereof; forming a sacrificial layer on the first electrode, where the sacrificial layer has a first sloped edge, the first sloped edge and the first sloped end are overlapped each other so that a thickness of the first sloped edge decreases as a thickness of the first sloped end increases; forming a first spacer on the first electrode, where the first spacer has contact with the first sloped edge; forming a beam electrode on the sacrificial layer and the first spacer; and removing the sacrificial layer after the forming the beam electrode.
Inventors:
Takashi Katsuki
Takeaki Shimauchi
Masahiko Imai
Osamu Toyoda
Ueda Tomofumi
Takeaki Shimauchi
Masahiko Imai
Osamu Toyoda
Ueda Tomofumi
Application Number:
JP2010048008A
Publication Date:
April 09, 2014
Filing Date:
March 04, 2010
Export Citation:
Assignee:
富士通株式会社
International Classes:
B81C1/00; B81B3/00; H01G5/16
Domestic Patent References:
| JP2007160495A | ||||
| JP2009277617A | ||||
| JP2002043530A | ||||
| JP2001189523A | ||||
| JP3263833A | ||||
| JP2006255856A | ||||
| JP2004314251A |
Attorney, Agent or Firm:
Yukio Kubo
Yasuhiro Sakata
Yasuhiro Sakata