Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
METHOD OF PRODUCING Ge-Sb-Te SPUTTERING TARGET MATERIAL
Document Type and Number:
Japanese Patent JP2001098366
Kind Code:
A
Abstract:

To provide a method of producing a Ge-Sb-Te sputtering target of a thin film medium for recording information by utilizing the phase transformation of a recording layer material.

In this method of producing a Ge-Sb-Te sputtering target material, an alloy powder containing Ge, Sb and Te and having tap density (relative density) of ≥50% is allowed to flow into a die and is subjected to cold or warm compacting, and the compacted material whose density after the cold compacting is ≥95% is sintered by being heated in Ar or vacuum atmosphere, by which the content of oxygen in the sintered body is controlled to ≤700 ppm.


Inventors:
HASHIMOTO KAZUYA
YANAGIMOTO MASARU
Application Number:
JP28192499A
Publication Date:
April 10, 2001
Filing Date:
October 01, 1999
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
SANYO SPECIAL STEEL CO LTD
International Classes:
C22C1/04; B22F3/10; C23C14/34; (IPC1-7): C23C14/34; B22F3/10; C22C1/04
Attorney, Agent or Firm:
Shiina Akira