Title:
MAGNETIC DISK SUBSTRATE POLISHING LIQUID
Document Type and Number:
Japanese Patent JP3680022
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a magnetic disk substrate polishing liquid capable of stably attaining further increase of polishing speed and further lowering of the surface roughness of a substrate.
SOLUTION: The magnetic disk substrate polishing liquid contains oxalic acid or an oxalate in addition to colloidal silica as abrasive grains and an oxidizing agent as a polishing accelerator.
Inventors:
Yusuke Ueda
Reception
Reception
Application Number:
JP2001374765A
Publication Date:
August 10, 2005
Filing Date:
December 07, 2001
Export Citation:
Assignee:
TOYO KOHAN CO.,LTD.
International Classes:
B24B1/00; B24B37/00; C09K3/14; G11B5/84; (IPC1-7): G11B5/84; B24B1/00; B24B37/00; C09K3/14
Domestic Patent References:
| JP2001148117A | ||||
| JP2001098254A | ||||
| JP2000160139A | ||||
| JP10172936A | ||||
| JP2001115145A |
Foreign References:
| WO1998054756A1 |
Attorney, Agent or Firm:
Naozumi Ono
Sachiko Okunuki
Sachiko Okunuki
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