To provide a magnetic-field-generating device for a magnetron sputtering apparatus, which has a widened eroding region by appropriately distributing the vertical component of a magnetic field on a target surface.
In the magnetic-field-generating device for the magnetron sputtering apparatus, which is provided with a magnetic circuit for generating the magnetic field, and a backing plate 5 for supporting a target 10 arranged in the vicinity of the magnetic circuit, the magnetic circuit comprises: a middle side permanent magnet 1 which is arranged so that a north pole and a south pole are positioned in a perpendicular direction to the target 10; an outside permanent magnet 2 which is formed so as to surround the middle side permanent magnet 1, and is arranged so that the south pole and the north pole are positioned in a perpendicular direction to the target 10; and a shunt plate 6 which is arranged in between the magnetic poles of the middle side permanent magnet 1 and the outside permanent magnet 2, and is attached to the backing plate 5 so as to be parallel to the target surface. The shunt plate 6 is also arranged so that the component perpendicular to the target surface of the magnetic field formed by the magnetic circuit on the target surface can form a flat region in which the values become zero or approximately zero, or cross a zero point three times.
NAKA SEIICHI
KASHIWABARA HIDEKI
Koichi Kajisaki
Yuzo Ozaki
Toshihiko Taniguchi
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