To obtain a filler-containing photosensitive resin composition that ensures a large photo-curing depth and is excellent in resolution even if a coating of the photosensitive resin composition to be patterned is thick and a large amount of the filler is contained.

In the filler-containing photosensitive resin composition, a magnetic filler 2 having a high aspect ratio and shape anisotropy is used as the filler. A substrate 3 is coated with the magnetic filler-containing photosensitive resin composition 1 and the resulting coating is preliminarily cured while applying a magnetic field in at least the direction of irradiation with light to orient the magnetic filler in the direction of application of the magnetic field. The coating is then selectively exposed in accordance with a prescribed pattern and the unexposed part is removed by development to form a high definition pattern. The photosensitive resin composition may be any of negative type and positive type photosensitive resin compositions.