To improve the magnetic characteristic of a magnetic film formed in vacuum after forming a ferrous film on a substrate in a plasma of an N atmosphere.

The process comprises setting a substrate 1 in a vapor deposition apparatus, exhausting it at 1×10-6Torr or lower, heating the substrate 1 up to 200°C at its film forming surface, flowing a gas of N at specified pressure of 3×10-4Torr here in the vapor deposition apparatus, actuating an electron gun to irradiate electrons on an Fe tablet in a plasma generating condition to melt and evaporate Fe to form an Fe film of 700-900 angstroms, evacuating enough to be vacuum, and forming a Sendust film 3 of about 5μm thick by the electron beam evaporation, forming a SiO2 film 4 of 2000 angstroms as a surface protective film for the Sendust film 3, and heat treating at 700°C in a N atmosphere for 5hrs. to form a laminate.