To provide a plasma utilizable for high-speed etching, etc., without causing charged damages, by forming a concentric magnetically neutral loop in a dielectric vacuum chamber, thereto add an electric field, to energize an NLD plasma in Maxwell,s distribution.

The same constant current flows in orderly winding coils 4 and 6, in upper and lower stage, and a constant current, in a direction reversly to the same constant current, flows in an unorderdly winding coil 5 in an intermediate stage, to form a concentric magnetically neutral loop in a dielectric vacuum chamber 1, at the level of the intermediate stage coil 5. When a high-frequency current of about 13.56MHz flows in a plasma generating high-speed coil 7 along the magnetically neutral loop, to generate an NLD plasma; this plasma is sufficiently thermalized, with high-frequency electric power applied, to be maxwell-distributed. This can obtain of plasma utillizable to high-speed etching, etc., for an Si wafer surface, etc., without causing charged damages.