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Title:
MAGNETO-OPTICAL ALLOY SPUTTER TARGET
Document Type and Number:
Japanese Patent JP2005171380
Kind Code:
A
Abstract:

To provide a target with which a layer of a magneto-optical recording medium having improved characteristics can be steadily formed by sputtering and a method of producing the same.

The magneto-optical sputter target has a composition comprising at least one rare earth element and at least one transition metal, with a structure which includes a transition metal constituent and a finely mixed alloy constituent of a rare earth phase and a rare earth/transition metal intermetallic compound. The structure of the target contains a minimum of the intermetallic compound. The method of producing the sputter target includes a step of mixing particles of the transition metal constituent (preferably only alloyed transition metals) with particles of the finely mixed alloy to produce a powder blend and a step of subjecting the powder blend to a pressing operation in an oxidizing inhibiting environment for a time and at a temperature and pressure which minimizes the rare earth/transition metal intermetallic compound content of the target.


Inventors:
MARX DANIEL R
Application Number:
JP2004312470A
Publication Date:
June 30, 2005
Filing Date:
October 27, 2004
Export Citation:
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Assignee:
MATERIALS RESEARCH CORP
International Classes:
B22F3/14; B22F3/15; C22C1/04; C23C14/14; C23C14/34; G11B7/243; G11B7/26; G11B11/10; G11B11/105; (IPC1-7): C23C14/34; B22F3/14; B22F3/15; G11B11/105
Attorney, Agent or Firm:
Hideto Asamura
Hajime Asamura
Yutaka Yoshida
Yukio Iwamoto