Title:
MAGNETORESISTANCE ELEMENT
Document Type and Number:
Japanese Patent JPS6218077
Kind Code:
A
Abstract:
PURPOSE:To simplify the process and resolve problems related to the difference of etching rates by a method wherein lead parts which connect magneto resistance parts to external parts are made of the same composition material as the magnetoresistance parts and given larger sectional area than the magnetoresistance parts. CONSTITUTION:A plurality of magnetoresistance parts 2 are formed on a sub strate 1 close and parallel to each other. Lead parts 4 at both ends of the magnetoresistance parts 2 are made of the same material as the magneto resistance parts 2 and given the same thicknesses. Therefore, in order to make the resistance values of the lead parts 4 as low as possible, they are so formed as to have the widths as wide as possible on the pattern to enlarge the sectional area. To form this magnetic element, a film 6 of magnetic resistance material such as intermetallic compound is evaporated on the substrate 1; a resist film 10 is applied to the parts where the magnetoresistance parts; and lead parts are formed; and, after the exposed magnetoresistance material film 6 is etched, the resist film 10 is removed.
Inventors:
MATSUYAMA YOSHIHIKO
OSHIMA HISAO
OSHIMA HISAO
Application Number:
JP15735585A
Publication Date:
January 27, 1987
Filing Date:
July 16, 1985
Export Citation:
Assignee:
DAI ICHI SEIKO CO LTD
International Classes:
H01F10/06; H01L43/08; (IPC1-7): H01F10/06
Domestic Patent References:
| JPS58154282A | 1983-09-13 |
Attorney, Agent or Firm:
Ishido