Title:
MAINTENANCE METHOD, MAINTENANCE APPARATUS, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD
Document Type and Number:
Japanese Patent JP2010171453
Kind Code:
A
Abstract:
To provide an exposure apparatus maintenance method that prevents liquid contamination.
The exposure apparatus includes a nozzle member (70) having at least one of a supply port (12) for supplying a liquid and a recovery port (22) for recovering the liquid. The nozzle member (70) is cleaned by immersing the nozzle member (70) with a cleaning solution LK stored in a container (31).
Inventors:
FUJIWARA TOMOHARU
NISHII YASUFUMI
SHIRAISHI KENICHI
NISHII YASUFUMI
SHIRAISHI KENICHI
Application Number:
JP2010092301A
Publication Date:
August 05, 2010
Filing Date:
April 13, 2010
Export Citation:
Assignee:
NIKON CORP
International Classes:
H01L21/027; G02B21/00
Domestic Patent References:
| JP2006032750A | 2006-02-02 | |||
| JP2006024706A | 2006-01-26 |
Foreign References:
| WO2004105107A1 | 2004-12-02 | |||
| WO1999049504A1 | 1999-09-30 | |||
| WO2004090956A1 | 2004-10-21 | |||
| WO2005124833A1 | 2005-12-29 | |||
| WO2005076323A1 | 2005-08-18 |
Attorney, Agent or Firm:
Masatake Shiga
Tadashi Takahashi
Kazuya Nishi
Tadashi Takahashi
Kazuya Nishi
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