Title:
MALEIMIDE COMPOUND AND METHOD FOR PRODUCING THE SAME
Document Type and Number:
Japanese Patent JP2002069056
Kind Code:
A
Abstract:
To obtain a maleimide compound useful as a monomer for a photoresist excellent in dry etching resistance.
Maleic acid or its derivative is reacted with a compound of a compound represented by formula (II) (ring Z is an ortho-condensed alicyclic hydrocarbon ring which may contain a substituent group (a 1-4C alkyl group or the like) or the like; X is an alkylene group; n is 0 or 1) to produce a maleimide compound represented by formula (I) containing a polycyclic structure as an N-substituent group.
Inventors:
HORAI AKIRA
FUNAKI KATSUNORI
FUNAKI KATSUNORI
Application Number:
JP2000262405A
Publication Date:
March 08, 2002
Filing Date:
August 31, 2000
Export Citation:
Assignee:
DAICEL CHEM
International Classes:
G03F7/032; C07D207/448; C08F22/40; (IPC1-7): C07D207/448; C08F22/40; G03F7/032
Attorney, Agent or Firm:
Mitsuo Hokita
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