To form a colored layer free from uneven thickness and voids around a pigment and to eliminate a characteristic shape trace on the colored layer by adjusting wetting of a base board and etching a protruded part in formation of the colored layer.
A black matrix 2 is formed on a transparent base board 1. The base board 1 is washed or processed by UV drying for setting surface energy constant, and wetting of the base board 1 is controlled. Then, a colored layer 3 with a set film thickness or more is formed. The film thickness of the colored layer 3 is designed to be finally equalized to the height of the black matrix 2. On both side faces of a mask 4 facing the base board 1 and having a through hole 4a, filters 5 are arranged. Exposure is carried out from the back face of the base board 1 while sensitiveness or exposure is regulated for keeping the respective color levels constant. Side etching is advanced faster than etching from the front surface, so that an unexposed part of the pigment surface and a part protruded from the pigment are eliminated.
ISHII KENJIRO
KAZETAGAWA SHINICHIRO
KAMATSUKA YOSHIYUKI
