Title:
MANUFACTURE OF CYLINDRICAL CAPACITOR
Document Type and Number:
Japanese Patent JP3494194
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To simplify a process by using an oxide film as an anti-etching film formed by oxidizing a part of a conducting layer while a left anti-oxidizing film is used as a restraining layer for oxidation.
SOLUTION: After an anti-oxidizing film and a part of a conducting layer are etched, an anti-oxidizing film pattern 22a is formed, which is used as a restraining layer for oxidation. An oxide film 24 is formed by oxidizing a part of the exposed conducting layer 15. After the anti-oxidizing pattern 22a is eliminated, the oxide film 24 is used as an etching mask. The external surface of a cylinder is formed by a dry etching process which uses the conducting layer 15 exposed on both sides of the oxide film 24 as an etching object. The whole part of the oxide film 24 is so etched that only a part (24a) of both side surface of the oxide film having a selected thickness is left. The remaining oxide film 24a is used as a mask, and the conducting layer 15 which is exposed so as to form the internal layer of the cylinder is subjected to dry etched. Thereby a storage node pattern 15a of cylindrical structure is formed.
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Inventors:
Tae Sung Kim
Application Number:
JP11262096A
Publication Date:
February 03, 2004
Filing Date:
May 07, 1996
Export Citation:
Assignee:
Samsung Electronics Co.,Ltd.
International Classes:
H01L27/04; H01L21/02; H01L21/822; H01L21/8242; H01L27/108; H01L21/768; (IPC1-7): H01L21/8242; H01L21/822; H01L27/04; H01L27/108
Domestic Patent References:
| JP4137759A | ||||
| JP4364068A |
Attorney, Agent or Firm:
Masaki Hattori
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