Title:
MANUFACTURE OF DEPOSITED FILM
Document Type and Number:
Japanese Patent JP3583182
Kind Code:
B2
Abstract:
PURPOSE: To improve gas barrier properties even under the high hymidity condition.
CONSTITUTION: In a method of manufacturing a deposited film, at least one surface of an ethylene-vinyl ester copolymer having the ethylene content of 20-65mol% in the thickness of 3-30μm and the saponification degree of 90mol% or more is plasma processed, and then a silicon oxide is plasma chemical deposited on the surface, and in a method of manufacturing a laminated, a base is laminated with the deposited surface of the deposited film by the dry lamination or the knee ram lamination.
Inventors:
Aki Haruta
Hiroto Tadashi
Hiroto Tadashi
Application Number:
JP5066595A
Publication Date:
October 27, 2004
Filing Date:
March 10, 1995
Export Citation:
Assignee:
KURARAY CO.,LTD.
International Classes:
C08J7/00; B32B27/28; B32B37/20; C08J7/06; C23C14/10; C23C16/02; (IPC1-7): B32B27/28; C08J7/00; C08J7/06; C23C16/02
Domestic Patent References:
| JP5208475A | ||||
| JP6092145B2 | ||||
| JP3099842A | ||||
| JP4212842A | ||||
| JP6330318A | ||||
| JP6340023A | ||||
| JP1267032A | ||||
| JP8509264A |
Foreign References:
| WO1994011544A1 |