Title:
MANUFACTURE OF DIFFRACTION GRATING
Document Type and Number:
Japanese Patent JPS6457208
Kind Code:
A
Abstract:
PURPOSE:To easily form a diffraction grating having a phase shift by using a usual interference exposing method, by forming a covering layer which is not dissolved by a solvent of a resist, to uniform thickness, removing by etching only the part on the resist of the covering layer, and thereafter, etching a substrate by using the covering layer as a mask. CONSTITUTION:On a part or the whole of a resist 12 of a diffraction grating pattern which is formed on a substrate 11, a covering layer 13 which is not dissolved by a solvent of the resist 12 is formed to uniform thickness. Subsequently, only the part on the resist 12 of the covering layer 13 is removed by etching. After the resist 12 is removed, etching of the substrate 11 is executed by using the covering layer 13 as a mask. In such a way, by utilizing the resist of the diffraction grating pattern which has bee formed by a usual interference exposing method, a diffraction grating having a phase shift of 1/4 wavelength can be obtained by a simple process.
Inventors:
SUGIMOTO HIROSHI
MATSUI TERUHITO
OTSUKA KENICHI
ABE YUJI
OISHI TOSHIYUKI
MATSUI TERUHITO
OTSUKA KENICHI
ABE YUJI
OISHI TOSHIYUKI
Application Number:
JP21558287A
Publication Date:
March 03, 1989
Filing Date:
August 28, 1987
Export Citation:
Assignee:
MITSUBISHI ELECTRIC CORP
International Classes:
G02B6/122; G02B5/18; G02B6/124; H01S5/00; (IPC1-7): G02B5/18; G02B6/12; H01S3/18
Attorney, Agent or Firm:
Masuo Oiwa