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Patent Searching and Data


Title:
MANUFACTURE OF DUSTPROOF COVER FOR PHOTOMASK
Document Type and Number:
Japanese Patent JPS6035733
Kind Code:
A
Abstract:

PURPOSE: To obtain easily the titled cover of a uniform thickness with high reproducibility by adhering a frame to a thin nitrocellulose film formed on a smooth substrate and by immersing the film in water to strip the substrate.

CONSTITUTION: A smooth substrate such as a silicon substrate having ≥λ/4 smoothness is coated with a soln. contg. 3W15wt% nitrocellulose having 10.7W 12.2% nitrogen content by means of a spin coater under conditions of 25W30°C casting temp., 5W10cc extent of casting and 500W3,000r.p.m. number of revolutions of the spinner to form a thin nitrocellulose film of 0.5W3μm thickness. A frame is adhered to the film, and the film is immersed in water for ≥15min to strip the substrate. The film is then taken out of the water and dried. The thin nitrocellulose film can be stretched tight on the frame.


Inventors:
FUKUMITSU YASUNORI
KOUNO MITSUO
Application Number:
JP14438483A
Publication Date:
February 23, 1985
Filing Date:
August 09, 1983
Export Citation:
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Assignee:
ASAHI CHEMICAL IND
International Classes:
B29C41/12; G03F1/00; G03F1/62; H01L21/027; B29K1/00; B29L7/00; (IPC1-7): B29C41/12; B29K1/00; B29L7/00; H01L21/30
Attorney, Agent or Firm:
Kazuo Watanabe