Title:
MANUFACTURE OF ELECTRON EMISSION SOURCE
Document Type and Number:
Japanese Patent JPH11317153
Kind Code:
A
Abstract:
To provide an electron emission source, easy to manufacture and long in life.
In this manufacturing method, a photosensitive resin liquid is applied over the surfaces of electrodes 6, a photosensitive resin layer 7 with a desired pattern is molded by a photo-lithography process and then baked in a vacuum atmosphere, and therefore electron emission sources 9 made of a carbon film are formed on the electrodes. Electrons can be emitted by a low electric field without molding needle-shaped emission sources. As the baking temperature varies with material quality of the electrodes 6,500°C to 800°C is suitable for an ITO(indium-tin oxide) and for a metallic material, and 800°C to 1100°C for silicon.
Inventors:
MURAKAMI HIROHIKO
YAMAKAWA HIROYUKI
YAMAKAWA HIROYUKI
Application Number:
JP12156898A
Publication Date:
November 16, 1999
Filing Date:
May 01, 1998
Export Citation:
Assignee:
ULVAC CORP
International Classes:
H01J9/02; H01J1/30; H01J1/304; H01J29/04; H01J31/12; (IPC1-7): H01J9/02; H01J1/30; H01J29/04; H01J31/12
Attorney, Agent or Firm:
Shigeo Ishijima (1 outside)