MANUFACTURE OF EVAPORATION SOURCE, MOLECULAR BEAM EPITAXY APPARATUS AND SEMICONDUCTOR DEVICE

Title:

MANUFACTURE OF EVAPORATION SOURCE, MOLECULAR BEAM EPITAXY APPARATUS AND SEMICONDUCTOR DEVICE

Document Type and Number:

Japanese Patent JPS63272026

Kind Code:

A

Abstract:

A source assembly adapted to provide one or more metal organic compounds into an MBE reaction chamber wherein the source assembly comprises a mixer manifold which has one or more inlet connectors for providing the metal organic compounds. Each inlet connector includes a resistance valve for defining a flow rate of vapour of the metal organic compound under a pre-set pressure gradient and an on/off valve for selecting the operational status of the source. Preferably the mixer manifold acts as a collimator which avoids the need to fit a rotating substrate.

Inventors:

KURISUTOFUAA JIYOOJI TEYUTSUPE
DABITSUDO AASAA ANDORIYUUSU

Application Number:

JP8704588A

Publication Date:

November 09, 1988

Filing Date:

April 08, 1988

Export Citation:

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Assignee:

BRITISH TELECOMM

International Classes:

C23C14/24; C30B23/08; C30B25/14; H01L21/203; (IPC1-7): C23C14/24; C30B23/08; H01L21/203

Domestic Patent References:

JPS57173933A

1982-10-26

Attorney, Agent or Firm:

Naotaka Ide

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