Title:
MANUFACTURE OF FLUORIDE GLASS WAVEGUIDE
Document Type and Number:
Japanese Patent JPH05215930
Kind Code:
A
Abstract:
PURPOSE:To manufacture a waveguide having an exact rectangular cross section by forming a circuit pattern by lithography and reactive ion etching on a heat resistance resin layer formed on a substrate, and using it as a mold for forming the waveguide. CONSTITUTION:A heat resistance resin layer 4 which becomes a mold is formed on a substrate 3, silicone which becomes a mask of the resin layer 4 is subjected to sputter coating thereon in the post-process, a photosensitive resist is subjected to spin coating, a mask puttern is exposed by ultraviolet rays, and development is executed. In such a way, a circuit pattern is transferred to the resin layer 4 by lithography. Subsequently, by using the photosensitive resist after the development as a mask, an exposed silicon layer is subjected to etching, and next, by using the remaining silicone layer as a mask, the exposed resin layer 4 is subjected to reactive ion etching, and a groove-like opening part is formed. Thereafter, while rotating the substrate 3, a fluoride glass molten liquid 6 is dripped down to a mold 5 on the heated substrate 3, and the mold 5 is filled therewith. Subsequently, by eliminating the mold 5, a fluoride glass waveguide 1 is formed.
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Inventors:
SAKAGUCHI SHIGEKI
Application Number:
JP2028892A
Publication Date:
August 27, 1993
Filing Date:
February 05, 1992
Export Citation:
Assignee:
NIPPON TELEGRAPH & TELEPHONE
International Classes:
G02B6/13; G02B6/12; (IPC1-7): G02B6/12
Attorney, Agent or Firm:
Masatake Shiga