MANUFACTURE OF HEAT INSULATION LAYER FOR THERMAL HEAD

Title:

MANUFACTURE OF HEAT INSULATION LAYER FOR THERMAL HEAD

Document Type and Number:

Japanese Patent JP3298778

Kind Code:

B2

Abstract:

PROBLEM TO BE SOLVED: To efficiently form a heat insulation layer of stable quality by oxygen reactive sputtering by previously introducing inert gas of a predetermined quantity and oxygen gas of necessary minimum flow rate into the interior of a sputtering chamber, and increasing the flow rate of the oxygen gas as the start of supplying sputtering power.
SOLUTION: Argon gas of about 200sccm and oxygen gas of about 50sccm are introduced into a sputtering chamber at the time of rising sputtering power (starting film formation). When the supply amount of the oxygen gas is increased substantially synchronously with the rising of the power and the power arrives at 3kw after 10 to 20sec, the flow rate of the oxygen gas is set to about 100sccm of the necessary quantity. When the power arrives at 3kw, a gas flow control unit such as a gas flow adapter like a lamp up adapter is, for example, disposed between the chamber and a mass flow controller so that the flow rate of the oxygen gas does not overshoot to exceed about 100sccm of the necessary quantity when the power arrives at 3kw.

Inventors:

Takashi Shirakawa
Satoshi Kubo

Application Number:

JP1000296A

Publication Date:

July 08, 2002

Filing Date:

January 24, 1996

Export Citation:

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Assignee:

Alps Electric Co., Ltd.

International Classes:

B41J2/335; (IPC1-7): B41J2/335

Domestic Patent References:

JP6191073A
JP5339724A

Attorney, Agent or Firm:

Shunsuke Nakao (1 person outside)

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