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Title:
MANUFACTURE OF HIGH-PURIFY BENZENE AND PARA-RICH XYLENE BY COMBINING AROMATIZATION AND SELECTIVE DISPROPORTIONATION OF IMPURE TOLUENE
Document Type and Number:
Japanese Patent JPH08119882
Kind Code:
A
Abstract:

PURPOSE: To selectively obtain the product rich in benzene and p-xylene that contains no following impurities having close boiling points to that of toluene, in other words, from which the impurities can be readily separated by simple distillation by allowing an impure toluene flow containing non-aromatic impurities having boiling points close to that of toluene to contact with a specific catalyst.

CONSTITUTION: A toluene-containing feedstock comprising >70% toluene (A) and 0.2-5 wt.% of close-boiling non-aromatic impurities (AI) (for example, a product that is prepared by aromatization of paraffinic feedstock over a nonacidic catalyst with an α value of <10 as L-zeolite) is passed over (B) an acidic intermediate pore zeolite that has an α value of >10 and high para- selectivity (for example, ZSM-5 molecular sieve catalyst that is selected by coking so that it contains 1-40% of coke) at 700-1,200°F to produce the objective product rich in benzene and p-xylene with the AI content reduced.


Inventors:
JIERARUDO JIEI NAKAMURI
ROBAATO EI INESU
AANORUDO JIEI GUROIN
Application Number:
JP24418494A
Publication Date:
May 14, 1996
Filing Date:
October 07, 1994
Export Citation:
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Assignee:
CHEVRON USA INC (US)
International Classes:
B01J29/40; B01J29/44; B01J29/84; B01J29/85; C07B61/00; C07C6/12; C07C7/148; C07C15/04; C07C15/06; C07C15/08; C10G35/095; (IPC1-7): C07C15/04; B01J29/40; B01J29/44; B01J29/84; B01J29/85; C07C6/12; C07C7/148; C07C15/06; C07C15/08; C10G35/095
Attorney, Agent or Firm:
Akira Asamura (3 outside)