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Title:
MANUFACTURE OF HIGH REFLECTING MIRROR
Document Type and Number:
Japanese Patent JPS5922003
Kind Code:
A
Abstract:

PURPOSE: To obtain a reflecting mirror which has reflecting surfaces protected and an improved reflection factor and is suitable to a rotating polygon mirror, etc., by forming an SiO2 film and a TiO2 film over a specularly finished base material in order.

CONSTITUTION: The blank 1 of the rotating polygon mirror which has small polygonal planes 1a is specularly finished by, for example, corrosion resisting Al alloy and then an Al film 2 is formed on each plane 1a to about 1,000. Then, the SiO2 film 3 and the TiO2 film 4 are formed in order to optical film thickness nd and λ0/4 (where (n) is a refractive index, (d) is geometric thickness, and λ0 is in-use wavelength). The Al film 2 may be omitted depending on the state and kind of the base material 1. Thus, a reflection factor higher than that of the cut mirror surface is obtained, the mirror surfaces are protected, and a decrease in reflection factor due to oxidation is prevented, obtaining the reflecting mirror suitable to obtain a galvanomirror, etc., for the optical deflector of, specially, a laser printer, etc.


Inventors:
WATABE ROKUROU
Application Number:
JP13160982A
Publication Date:
February 04, 1984
Filing Date:
July 28, 1982
Export Citation:
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Assignee:
RICOH KK
International Classes:
C23C14/00; C23C14/08; G02B1/10; G02B5/09; G02B26/08; (IPC1-7): C23C13/04; G02B1/10
Domestic Patent References:
JPS5424046A1979-02-23
Attorney, Agent or Firm:
Toru Kabayama



 
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