Title:
MANUFACTURE OF INORGANIC THIN FILM
Document Type and Number:
Japanese Patent JPS58155722
Kind Code:
A
Abstract:
PURPOSE:To make it possible to manufacture an inorganic thin film locally containing a metallic impurity without the need for a treatment with aqua regia, by locally exposing a metal thin film laminated on an inorganic thin film. CONSTITUTION:An inorganic thin film is formed on a substrate, and a metal thin film is laminated on the inorganic thin film. Then, the metal thin film is subjected to a local exposure having an intensity sufficient for the metal forming the metal thin film to move. As a result, the metal forming the metal thin film in the non-exposed region is absorbed in the inorganic thin film in the exposed region, so that the metal is absorbed in almost only the inorganic thin film in the exposed region. By this method, it is possible to manufacture an inorganic thin film locally containing a metallic impurity without the need for a treatment with aqua regia which may damage the whole of the inorganic thin film.
Inventors:
FUNAKOSHI NORIHIRO
MAEFUTSU SAKAE
MAEFUTSU SAKAE
Application Number:
JP3874382A
Publication Date:
September 16, 1983
Filing Date:
March 11, 1982
Export Citation:
Assignee:
NIPPON TELEGRAPH & TELEPHONE
International Classes:
H01L21/205; H01L21/027; H01L21/22; H01L21/28; H01L21/30; (IPC1-7): H01L21/02; H01L21/20; H01L21/22; H01L21/28
Domestic Patent References:
| JPS5723225A | 1982-02-06 | |||
| JPS5565365A | 1980-05-16 | |||
| JPS5133726A | 1976-03-23 |
Attorney, Agent or Firm:
Takashi Sawai