PURPOSE: To manufacture inexpensively a thin metallic Be plate of extremely thin thickness and high purity in excellent productivity, by etching a base plate obtained by vapor depositing Be or a metal contg. Be on its surface and cold rolling the obtained thin film.
CONSTITUTION: A base plate 1 made of Cu or Al, etc. is set in a vacuum vessel 10, and the base plate 1 is heated to the prescribed temperature by a heater H after evacuating the inside of the vessel 10. Next, Be or a metal contg. Be is melted and vaporized by heating the base 1 with heaters (h) to deposit it on the base plate 1 thereby forming a thin film 2. Next, the base plate 1 with formed thin film 2 is taken out from the vessel 10, and the plate 1 itself is removed by etching it by using a nitric acid or an aqueous solution of NaOH to leave only the thin film 2 behind. Successively, the film 2 is inserted between rolls 4, 4 arranged oppositely to roll the film 2 by required number of rollings, thereby an extremely thin Be or a metallic thin plate contg. Be is manufactured.
YAMAGUCHI MASAYASU
OGASAWARA KIYOHIDE
ONOUE ATSUSHI
KAMIBAYASHI TAKEHIRO
TSUKAGOSHI NOBUHIRO
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