PURPOSE: To continuously and efficiently manufacture the high purity metallic Ti by sticking and forming metallic Ti on the surface of metallic Ti grains in a reactor by each gaseous body of titanium halide and Mg, fluidizing the metallic Ti grains in an another reactor and removing impurities.
CONSTITUTION: Fine-grained metallic Ti is charged onto a dispersion plate 2 at the bottom of a reactor 1, and from the lower direction of the dispersion plate 2, each steam of TiCl4 and Mg as well as an Ar gas heated by a plasma heater 4 are blown in to form a fluidized bed, and metallic Ti formed by a reducing reaction is stuck and accumulated on the surface of the metallic Ti grains. The metallic Ti grains which have grown in the reactor 1 are continuously introduced into a reactor 5 for refluidizing treatment, in which an Ar gas heated to about 1300 to 1400°C by a plasma heater 6 is blown from the lower direction of a dispersion plate 11 to dry away MgCl4, Mg, etc., sticking the metallic Ti grains in a fluidized state and MgCl4, Mg, etc., contaminated on the inside. Next, the metallic Ti grains in the reactor 5 are sent to a classifier 7 and are classified into the metallic Ti grains of fine grains and the ones having prescribed grain size or above, and the fine grains are returned into the reactor 1.
IZEKI JUNKICHI
MORIYA ATSUROU
MAEHARA KUNIO
ANPO SHIGEO
WATANABE HIDEYA
ITO HIDEO
MITSUYA TAKASHI
SAKATA NAOKI
SATO NAOKUNI
TOHO TITANIUM CO LTD
SHOWA DENKO KK
KOBE STEEL LTD
SUMITOMO METAL IND
NIPPON KOKAN KK