Title:
MANUFACTURE OF METHACRYLIC RESIN COMPOSITION
Document Type and Number:
Japanese Patent JP3049891
Kind Code:
B2
Abstract:
PURPOSE: To provide a method for manufacturing a methacrylic resin composition excellent in antistatic properties and appearance.
CONSTITUTION: The objective method is to manufacture a methacrylic resin composition, which comprises mixing a methacrylic resin with an alkylsulfonic acid salt represented by the general formula R-SO3X (wherein R is 8-22C alkyl; X is an alkali metal) and melt compounding the mixture through a vented extruder.
Inventors:
Go Hashimoto
Takashi Sakamoto
Takashi Sakamoto
Application Number:
JP32738691A
Publication Date:
June 05, 2000
Filing Date:
December 11, 1991
Export Citation:
Assignee:
Sumitomo Chemical Co., Ltd.
International Classes:
C08J3/20; C08K5/42; C08L33/04; C08L33/12; C09K3/16; C11D1/12; (IPC1-7): C08L33/12; C08J3/20; C08K5/42; C09K3/16
Domestic Patent References:
| JP62109826A | ||||
| JP63284227A | ||||
| JP6424845A | ||||
| JP343440A |
Attorney, Agent or Firm:
Mitsuhiro Moroishi (1 person outside)
Previous Patent: バインダー
Next Patent: POSITIVE ELECTRODE ACTIVE MATERIAL FOR NONAQUEOUS ELECTROLYTE BATTERY AND NONAQUEOUS ELECTROLYTE BAT...
Next Patent: POSITIVE ELECTRODE ACTIVE MATERIAL FOR NONAQUEOUS ELECTROLYTE BATTERY AND NONAQUEOUS ELECTROLYTE BAT...