Title:
MANUFACTURE OF MICROSTRUCTURE
Document Type and Number:
Japanese Patent JPH02103855
Kind Code:
A
Abstract:
PURPOSE: To prevent the accumulation of foreign matter due to an electron beam by slowly scanning the electron beam focused to a cross section of small breadth, using a line type pattern and then stacking a material existing in the indebted focal point space of an electron beam device. CONSTITUTION: An electron beam focused to a spot or a micro probe of relatively small breadth in an electron beam device is slowly scanned by use of a line type pattern and a micro body structure is formed by stacking a material existing within the indebted focal point space of the electron beam device. According to this construction, foreign matter existing within the electron beam device is prevented from accumulating on a non-heated object such as a non- heated sample to be inspected, and an inspection surface is thereby kept clean.
Inventors:
GOTSUTOFURIIDO MERENSUTETSUTO
PEETAA MIKAERU KUROIZAA
PEETAA MIKAERU KUROIZAA
Application Number:
JP18166689A
Publication Date:
April 16, 1990
Filing Date:
July 15, 1989
Export Citation:
Assignee:
PHILIPS NV
International Classes:
H01J37/31; H01J9/02; H01J37/317; (IPC1-7): H01J9/04; H01J37/31
Attorney, Agent or Firm:
Akihide Sugimura (1 outside)