Title:
MANUFACTURE OF PHASE INVERSION MASK
Document Type and Number:
Japanese Patent JPH06222547
Kind Code:
A
Abstract:
PURPOSE: To provide the manufacture of the phase inversion mask which eliminates a bridge pattern film.
CONSTITUTION: For the manufacture of the phase inversion mask for superfine patterning, side wall phase inversion films 16a are formed on both flanks of each phase inversion film 15a, in a spatial frequency modulation type phase inversion mask. Therefore, light intensity generated by the tip part of the phase inversion film 15a which is a formation factor of a bridge pattern film is reduced by the side wall phase inversion films 16a.
Inventors:
UN SOPU KUMU
Application Number:
JP10027992A
Publication Date:
August 12, 1994
Filing Date:
March 27, 1992
Export Citation:
Assignee:
GOLD STAR ELECTRONICS
International Classes:
G03F1/30; G03F1/68; G03F1/80; G09F1/08; H01L21/302; H01L21/3065; (IPC1-7): G03F1/08; G09F1/08; H01L21/302
Domestic Patent References:
| JPH04254855A | 1992-09-10 | |||
| JPH04166938A | 1992-06-12 | |||
| JPH0476550A | 1992-03-11 |
Attorney, Agent or Firm:
Masaki Yamakawa
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