MANUFACTURE OF PHOSPHOR PATTERN, PHOSPHOR PATTERN, AND BACK PLATE FOR PLASMA DISPLAY PANEL

Title:

MANUFACTURE OF PHOSPHOR PATTERN, PHOSPHOR PATTERN, AND BACK PLATE FOR PLASMA DISPLAY PANEL

Document Type and Number:

Japanese Patent JP09288974

Kind Code:

A

Abstract:

To provide a phosphor pattern that is excellent in the property of being buried in a space in a substrate for a PDP(plasma display panel), dimensional accuracy, and pattern formability, is high in definition, uniform in configuration, and excellent in brightness.

(I) First, the phosphor-containing photosensitive resin composition layer of a photosensitive element wherein the phosphor-containing photosensitive resin composition layer 3 is deposited on a support film is brought into contact with the inner surface of a recess on an uneven substrate 1 under pressure. (II) Next, active light rays 6 are applied in the form of an image to the photosensitive resin composition layer. (III) Thereafter, the photosensitive resin composition layer is selectively removed by developing to form a pattern. (IV) Next, unwanted parts are removed from the pattern by baking to form a phosphor pattern 7.

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Inventors:

Tanaka, Hiroyuki
Tachiki, Hideyasu
Nojiri, Takeshi
Tai, Seiji
Wada, Yumiko
Sato, Kazuya
Kimura, Naoki
Mukai, Ikuo
Tanno, Seikichi
Kakumaru, Hajime

Application Number:

JP1997000037688

Publication Date:

November 04, 1997

Filing Date:

February 21, 1997

Export Citation:

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Assignee:

HITACHI CHEM CO LTD

International Classes:

G03F7/004; B32B7/02; C09D4/00; C09D4/06; C09K11/02; G03F7/027; G03F7/028; G03F7/033; G03F7/11; G03F7/18; G03F7/30; G03F7/40; H01J9/227; H01J11/02; H01J17/04; H05B33/10; G03F7/004; B32B7/02; C09D4/00; C09D4/06; C09K11/02; G03F7/027; G03F7/028; G03F7/033; G03F7/11; G03F7/18; G03F7/30; G03F7/40; H01J9/227; H01J11/02; H01J17/04; H05B33/10; (IPC1-7): H01J9/227; B32B7/02; C09D4/06; C09K11/02; G03F7/004; G03F7/027; G03F7/028; G03F7/033; G03F7/11; G03F7/18; G03F7/30; G03F7/40; H01J11/02; H01J17/04; H05B33/10

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