Title:
MANUFACTURE OF PHOTOMASK
Document Type and Number:
Japanese Patent JPS5487069
Kind Code:
A
Abstract:
PURPOSE:To form a negative pattern which excels in the resolution by making use of the excellent resolution characteristics of the positive resist. CONSTITUTION:The photomask is produced in order to etch the patterned resist as well as the positive-negative inverted pattern in case the blank photomask is etched. For this purpose, conducting electrode 3 of Au, Ni or the like is provided on the blank photomask which contains the thin film composed of 2nd basement material 2 of Si, Bi, Cr or the like on 1st basement material 1 of the glass, quartz, sapphire or the like. On the blank mask substrate of such 3-layer structure, the patterned electronic resist or photo resist 4 is provided. The metals of Au, Ni and the like are provided selectively through the selective plating method to the area where the resist patterned from the photomask does not exist, and then the resist is exfoliated. Then the patterned metal film thus obtained is used for the mask to carry out the chemical or physical etching, thus etching both the resist pattern obtained first and the positive-negative inverted pattern into the photomask.
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Inventors:
MORI KATSUMI
TAJIMA MASAO
SUZUKI KATSUMI
TAJIMA MASAO
SUZUKI KATSUMI
Application Number:
JP15523177A
Publication Date:
July 11, 1979
Filing Date:
December 22, 1977
Export Citation:
Assignee:
NIPPON ELECTRIC CO
International Classes:
H01L21/027; H01L21/302; (IPC1-7): H01L21/302