To enable the patterning onto a substrate at a high accuracy, and to form an image of high quality as the excellent and improved electron emitting characteristic, and to improve the yield by providing a process for surface treatment of a substrate so that a contact angle of a droplet with a substrate surface is within a range of the specified angle before a process for giving the droplet to the substrate surface.
A substrate 1 formed with element electrodes 2, 3 is washed by pure water ultrasonic wave and hot water at 80°C, and pulled up for drying, and the steam of 3-aminopropyl di-methyl ethoxysilane is deposited on a film forming surface of a glass board material. Aminoalkylsilane is strongly adhered to the film forming surface of the glass surface, and a stabilized silane layer provided with water repellency is formed. Hydrophobic treatment is performed to the substrate 1 so as to control the contact angle of a surface, with which a droplet contacts, with the droplet at 20-50° and spreading of the droplet is restricted, and a conductive thin film 4, in which unevenness of film thickness and resistance is suppressed and which has excellent stability and representability, is manufactured.
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MITSUMICHI KAZUHIRO
HASEGAWA MITSUTOSHI
SHIGEOKA KAZUYA
YAMANOBE MASATO
TEJIMA TAKAYUKI
YOSHIOKA TOSHIFUMI
