Title:
MANUFACTURE OF RADIATION REACTIVE PRECURSOR
Document Type and Number:
Japanese Patent JPS60223826
Kind Code:
A
Abstract:
Oligomeric and/or polymeric radiation-reactive polyimidazole and polyimidazo pyrrolone precursors which are soluble in organic solvents, can be prepared with high purity, i.e., especially without chloride, in a simple manner if an aromatic and/or heterocyclic tetraamino compound is reacted in the presence of a carbodiimide, with an olefinically unsaturated monocarboxylic acid and a dicarboxylic acid, or with an olefinically unsaturated monocarboxylic acid and an aromatic and/or heterocyclic tetracarboxylic acid dianhydride, or with an olefinically unsaturated tetracarboxylic acid diester, in the form of an addition product of the tetracarboxylic acid dianhydride and an olefinically unsaturated alcohol. The radiation-reactive precursors prepared in this manner are suitable, for instance, for the manufacture of highly heat-resistant relief structures.
Inventors:
HERUMUUTO AANE
Application Number:
JP6494685A
Publication Date:
November 08, 1985
Filing Date:
March 28, 1985
Export Citation:
Assignee:
SIEMENS AG
International Classes:
C08G73/10; C08G73/00; C08G73/18; C08G73/20; G03F7/038; G03F7/26; H01L21/47; (IPC1-7): C08G73/10
Domestic Patent References:
| JPS5636519A | 1981-04-09 |
Attorney, Agent or Firm:
Tomimura Kiyoshi