PURPOSE: To focus a focal point on first and second regions and to reduce a short-circuit between wirings due to out of focus by exposing photoresist films of the regions in separate steps.
CONSTITUTION: An entire main surface of a semiconductor substrate is coated with a photoresist film 9. However, steps corresponding to a base shape are formed on the surface of the film 9. Then, the film 9 is exposed by using a mask formed with a wiring pattern only on a memory cell array, and developed. Thereafter, with the film 9 as an etching mask a conductive film is patterned, and wirings 8 of the array are formed. Then, a photoresist film 10 is formed on the entire main surface of a semiconductor substrate. Thereafter, a focal point is focused on a peripheral circuit by using the mask formed with the wiring pattern of the peripheral circuit, the film 10 is exposed and developed. Thus, its yield can be improved.
SUWAUCHI NAOKATSU
MIYAZAWA HIROYUKI
