Title:
MANUFACTURE OF SEMICONDUCTOR SUBSTRATE FOR ASSESSING CONTAMINATION BY IMPURITIES
Document Type and Number:
Japanese Patent JPH07263511
Kind Code:
A
Abstract:
PURPOSE: To make it possible to easily produce a semiconductor substrate for accurately evaluating the degree of contamination by impurities in surface density for the principal surface of a semiconductor device produced or to be used for its production.
CONSTITUTION: A process for preparing a semiconductor substrate 1 having a principal surface already purified and a process for sticking impurities 2 for assessing the contamination on the purified principal surface 1a of the semiconductor substrate 1 by means of vapor deposition method, spattering method or chemical gaseous phase deposition method.
Inventors:
KUNII YASUO
Application Number:
JP7779894A
Publication Date:
October 13, 1995
Filing Date:
March 25, 1994
Export Citation:
Assignee:
NIPPON TELEGRAPH & TELEPHONE
International Classes:
H01L21/66; H01L21/02; H01L21/203; (IPC1-7): H01L21/66; H01L21/02; H01L21/203
Attorney, Agent or Firm:
Shoji Tanaka