PURPOSE: To control generation of unevenness in a development, by a method wherein a far ultraviolet irradiation process of the surface of a glass board is performed as a preprocess of a forming process of a photoresist.

CONSTITUTION: Wet abrasion of the surface of a glass board is performed and then rubbing washing, for which pure water is used to remove an abrasive grain, is performed. Then the glass board is dried by a spin drying or baking (150°C) after supersonic washing of the same with the pure water or the same is dried similarly by the baking after steam washing of the same, for which isopropyl alcohol is used. Then dry washing by far ultraviolet irradiation is performed. Hereupon, hours required for treatment of the glass board and hours for which the same is left as it is (extending from far ultraviolet treatment up to coating of a resist and from the coating of the resist up to developing) are closely connected with an effect of the far ultraviolet irradiation. It is preferable to make the hours for which the same is left as it is fall within one hour to materialize sufficiently the effect of the far ultraviolet irradiation. With this construction, a developing mark is controlled and yield in a manufacturing process of a stamper for optical memory can be improved.