PURPOSE: To improve the crystal orientation property by forming a superconductor layer in repeating the film formations in CVD method and in the spattering, and at the same time, carrying out the film formation in either method two rounds or more.
CONSTITUTION: By using an oxide type superconductor as a target material, the first superconductor membrane 2 is formed in the spattering on a substrate 1 which consists of a metal, a ceramic, or the like. Then, the second superconductor membrane 3 is superposed on the first superconductor membrane 2 in the CVD method. By superposing the second superconductor membrane 3 over the first superconductor membrane 2 formed in the spattering in such a way, a superconductor with a uniform crystal orientation can be formed. Then, the third superconductor membrane 4 is laminated in the spattering on the second superconductor membrane 3, and moreover, the fourth superconductor membrane 5 is laminated in the CVD method thereover. Thence, such processes are repeated in order to obtain a superconductor. In such a way, a superconductor layer with an excellent superconductive performance can be manufactured easily without reducing the productivity.
OSANAI YUTAKA
SADAKATA NOBUYUKI
AOKI SHINYA
NAKAGAWA MIKIO
