PURPOSE: To obtain a superconducting thin film of good quality and high capacity by irradiating a conjugate oxide thin film having an Nd2CuO4 type crystal structure with hydrogen ions or hydrogen plasma.
CONSTITUTION: A substrate 11 in which a conjugate compound film expressed by general formula of (A1-yBy)2CuX4 (where A denotes at least one kind among Nd, Sm and Pr, B denotes at least one kind of Ce and Th and X denotes at least one kind of O and F as well as O≤y≤0.2 is regulated) and having an Nd2CuO4 type crystal structure as essential components is formed on the surface by sputtering is charged to an ion source 31, to which a hydrogen gas is introduced as well as high frequency voltage is impressed on electrodes 32 and 33 to generate plasma. In the plasma, magnetic sources 34 are arranged; voltage is impressed between a substrate stand 35 on which the substrate 11 is disposed and the hydrogen ion and the plasma are generated effectively in the ion source; the hydrogen ions are drawn out from the ion source to irradiate the conjugate compound film, which is held under heating at ≤500°C. the superconducting thin film of good quality and high capacity having an Nd2CuO4 type crystal structure can be manufactured with good reproducibility.
| WO/2005/037415 | METHOD OF PRODUCING A POROUS ELEMENT AND APPLICATIONS THEREOF |
| JP2002302732 | ULTRAFINE GRAINED CUBIC BN SINTERED COMPACT |
| WO/2018/206220 | CERAMIC SURFACE, CMC COMPONENT AND PRODUCTION METHOD |
HAYASHI SHIGENORI
ADACHI HIDEAKI
HIRAO TAKASHI
WASA KIYOTAKA
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