PURPOSE: To obtain a transparent conductive film able to prevent lowering of luminous strength of a luminous layer due to moisture by providing a water repellent layer on the surface of the film and a transparent conductive film so as to lower moisture permeability.

CONSTITUTION: A transparent film 2 is fed from a feed role 1 into a vacuum tank 3. Then, inside a first chamber 7, a vapor deposition crucible 8 is heated to vaporize housed high molecules 9 so as to vapor-deposit the high molecules 9 on the surface of the transparent film 2. Later, in a second chamber 11, the vapor deposition crucible 12 is heated to vaporize housed metal oxide 13 such as indium oxide and tin oxide to vapor-deposit this-on the surface of a water repellent layerin order to form a transparent conductive film. A transparent film 2 is fed to a third chamber 15 and a vapor deposition crucible 16 is heated to vaporize housed high molecules 17, or organic gas is introduced from a gas lead-in tube 18 into the third chamber 15 for performing plasma polymerization to form a water repellent layer consisting of high molecules organic substances.