MANUFACTURE OF X-RAY MASK - MITSUBISHI ELECTRIC CORP

Title:

MANUFACTURE OF X-RAY MASK

Document Type and Number:

Japanese Patent JPH0613294

Kind Code:

A

Abstract:

PURPOSE: To obtain the manufacturing method of an X-ray mask wherein the end point of etching can be surely detected in a non-contact manner.

CONSTITUTION: When silicon 1 is etched back by retaining etching liquid above an X-ray mask 100 retained horizontally in a process, a light is cast from above the surface of the etching liquid 20, and the end point of etching is detected by detecting the refleted light from the surface.

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Inventors:

MARUMOTO KENJI
AYA ATSUSHI
HASHIMOTO MOTOKO
YABE HIDETAKA
MATSUI YASUTSUGU

Application Number:

JP16759392A

Publication Date:

January 21, 1994

Filing Date:

June 25, 1992

Export Citation:

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Assignee:

MITSUBISHI ELECTRIC CORP

International Classes:

G03F1/22; H01L21/027; H01L21/306; (IPC1-7): H01L21/027; G03F1/16; H01L21/306

Attorney, Agent or Firm:

Takada Mamoru

Next Patent: DROPOUT DEFECT CORRECTING METHOD OF X-RAY MASK AND X-RAY MASK WHOSE DROPOUT DEFECT IS CORRECTED