PURPOSE: To improve efficiency of abrasion by a method wherein the vacuum evaporated substance containing silicon oxide compound therein applied with a high frequency electric field to be ionized is vacuum evaporated on a substrate to make an abrasive layer and active oxygen is utilized during the application of the high frequency electric field.
CONSTITUTION: As one example, a chromium is put in at first as a vacuum evaporated material 7 in a vacuum evaporated material container 6 within a vacuum container 5 and the degree of vacuum in the vacuum container 5 is decreased down to 1×10-5(Torr). Oxygen gas is fed from a gas feeding pipe 11 until the degree of vacuum is intensified to 8×10-5(Torr) and oxygen gas atmosphere 10 is formed in the vacuum container 5. Under this condition, the chromium is evaporated by an electron beam heating and evaporated source 8 and the chromium particles evaporated with the high frequency electric field formed by an electrode 4 causes an oxidation reaction with oxygen gas. The chromium particles adhere to the vacuum evaporated substrate 1 made of vinyl chloride held by a holder 3, resulting in producing an abrasive layer with high abrasion efficiency.
NISHIGUCHI TAKASHI
FUJII TAKASHI
| JPS5576059A | 1980-06-07 |
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