To provide a manufacturing apparatus of a liquid crystal device which can prevent the abnormal discharge of a sputtering device.
The manufacturing apparatus includes: a film deposition chamber 2; a sputtering device 3 which is disposed on a side (in a Y direction) of the film deposition chamber 2 and performs the film deposition of an alignment layer material on a film deposition surface Ws of a substrate W in the film deposition chamber 2 by sputtering it to form an inorganic alignment layer; and a substrate conveyance means (roller 6r) which conveys the substrate W in an erect state so that the film deposition surface Ws is along a perpendicular direction (Z direction). The sputtering device 3 has a pair of targets 5a and 5b facing each other with a plasma generation region between, and the pair of targets 5a and 5b are disposed in erected states so that their surfaces facing each other are along perpendicular direction (Z direction).
Masatake Shiga
Kazunori Onami
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