PURPOSE: To provide a film-manufacturing apparatus in which substrates are interchanged in a short time and a superhigh vacuum is easily produced, by separating completely a superhigh vacuum vessel from a substrate interchanging chamber by a gate valve.

CONSTITUTION: A holder 35 for heating a substrate is set on a movable stand 34 for the substrate heating holder 35 through an inlet-outlet 39 for the substrare of an air- lock chamber 33, then the chamber 33 is evacuated by a roughing pump 22 to the order of 10-3 Torr with a roughing valve 21 opened. A gate valve 32 is opened after the valve 21 is closed. Feeding mechanisms 43, 44 for the movable stand 34 are revolved in order to feed the stand 34 from the chamber 33 through the valve 32 to a prescribed position in a superhigh vacuum chamber 31. After fitting of a manipulator 36 and the movable stand 34, and connection of a current terminal 45 at the same time, the mechanisms 43, 44 are revolved so as to convey the movable stand 34 to the chamber 33, and the valve 32 is closed. The superhigh vacuum vessel 37 is evacuated once again to 10-9 Torr by a superhigh vacuum pump within 30 min. Hereby, the time required for interchanging substrates is reduced to 1/10 that required by conventional methods.