Title:
異方性導電膜の製造方法及び異方性導電膜
Document Type and Number:
Japanese Patent JP6797535
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a manufacturing method of a pillar array structure capable of manufacturing the pillar array structure containing a metal column with higher aspect ratio and a manufacturing method of an anisotropic electroconductive film using the same.SOLUTION: By conducting electrolytic plating after conducting displacement plating to an opening pattern 2a with large aspect ratio obtained by forming a porous alumina layer 2 by anodic oxidizing a surface of an aluminum substrate 1 and wet etching the porous alumina layer 2, the opening pattern can be reliably filled with a metal. Thereby a pillar array structure 5 including a metal column 5a with diameter of 2 μm and height of 100 μm can be obtained.SELECTED DRAWING: Figure 5
Inventors:
Hideki Masuda
Takashi Yanagishita
Tomohiro Hayakawa
Bunichi Kakinuma
Toshiaki Hayakawa
Takashi Yanagishita
Tomohiro Hayakawa
Bunichi Kakinuma
Toshiaki Hayakawa
Application Number:
JP2016043549A
Publication Date:
December 09, 2020
Filing Date:
March 07, 2016
Export Citation:
Assignee:
Advantest Corporation
Tokyo Public University Corporation
Tokyo Public University Corporation
International Classes:
C25D1/00; B81C1/00; C23C18/18; C23C18/31; C25D11/24
Domestic Patent References:
| JP2012089481A | ||||
| JP2011080139A | ||||
| JP2006520697A | ||||
| JP2013057102A | ||||
| JP2010229506A | ||||
| JP2009523315A |
Attorney, Agent or Firm:
Longhua International Patent Service Corporation
Keizo Okamoto
Keizo Okamoto